Beyond Lithography: Particle Accelerators Could Revolutionize EUV
2025-03-20
Manufacturing the world's smallest and most complex objects—semiconductor chips—pushes the boundaries of physics. Extreme ultraviolet (EUV) lithography, using short-wavelength light to etch nanometer-scale patterns onto silicon, is at the forefront. ASML's innovative approach uses lasers to vaporize tin droplets, generating 13.5nm EUV light. However, researchers are exploring particle accelerators to generate even more powerful EUV beams by propelling electrons near light speed, potentially revolutionizing chip manufacturing.