GPU-Accelerated Computational Lithography: From Days to Hours
2025-03-07
Modern semiconductor manufacturing faces immense computational challenges, particularly in lithography for deep submicron chips. Traditional OPC techniques are limited by computational power, while ILT, though more flexible, demands massive resources, potentially utilizing thousands of CPU cores for days. To address this, NVIDIA, TSMC, and Synopsys collaborated to migrate lithography code from CPUs to GPUs, achieving significant speedups. By optimizing algorithms and leveraging GPU parallelism, they reduced ILT computation time from multiple days to under a day, achieving over a 15x speed increase. This breakthrough promises to greatly advance the semiconductor industry.